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Description:About AVS As a professional Society AVS supports networking among academic industrial government and consulting professionals involved in a variety of disciplines related to materials interfaces and

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Visit the ALD/ALE 2019 Website at https://ald2019.avs.org/ Twitter #ALDALE2018 Overview Committee Awards Manuscripts Abstract Submission Housing & Travel Things To Do Sponsors & Exhibitors Schedule Mobile App Online Scheduler Presentation Guidelines Tutorial Notes Register Visit the ALD/ALE 2019 Website Website: https://ald2019.avs.org/ {"slides_column":"4","slides_scroll":"1","dots":"false","arrows":"true","autoplay":"true","autoplay_interval":"1500","ticker":"false","speed":"200","center_mode":"false","loop":"true","rtl":"false"} Overview The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2018 Workshop (ALE 2018) , so that attendees can interact freely. The conference will take place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea. As in past conferences, the meeting will be preceded (Sunday, July 29) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, July 30-August 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+. Awards: Both ALD 2018 and ALE 2018 will recognize student achievement with awards for the best student posters and/or talks. See Awards Page SCHEDULE Awards ALE Flyer ALD Flyer ALD Program Chairs Program Chair: Jin-Seong Park Hanyang University, South Korea Program Co-Chair: Hanjin Lim Samsung Electronics, South Korea Program Co-Chair: HyunChul Choi LG Display, South Korea ALE Program Chairs Program Chair: Geun Young Yeom Sungkyunkwan University, South Korea Program Co-Chair: Ankur Agarwal KLA-Tencor, USA Key Dates Abstract Submission Deadline: February 16, 2018 Author Acceptance Notifications: April 10, 2018 Late News Abstract Deadline: May 9, 2018 Early Registration Deadline: June 1, 2018 (Closes July 20) Hotel Reservation Deadline: June 26, 2018 Manuscript Deadline: November 15, 2018 Downloads Sponsor & Exhibitor Form DOWNLOAD Oral Presentation Guidelines VIEW Poster Presentation Guidelines VIEW Copyright Transfer Form DOWNLOAD Follow Us Tweets by AvsAld Key Dates Abstract Submission Deadline: February 16, 2018 Author Acceptance Notifications: April 10, 2018 Late News Abstract Deadline: May 9, 2018 Early Registration Deadline: June 1, 2018 (Closes July 20) Hotel Reservation Deadline: June 26, 2018 Manuscript Deadline: November 15, 2018 Downloads Sponsor & Exhibitor Form Oral Presentation Guidelines Poster Presentation Guidelines Copyright Transfer Form Contact AVS Della Miller Event Manager 110 Yellowstone Dr. Suite 120 Chico, CA 95973 (530) 896-0477 della@avs.org Overview Abstract Submission Housing & Travel Sponsors & Exhibitors Schedule Register © 2018 AVS. All Rights Reserved....

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